SU-8 etching in inductively coupled oxygen plasma

Inductively Coupled Plasma Etching of Bulk Titanium for MEMS Applications

Titanium is a promising new material system for the bulk micromachining of microelectromechanical MEMS devices. Titaniumbased MEMS have the potential to be used for a number of applications, including those which require high fracture toughness or biocompatibility. The bulk titanium etch rate, TiO2 mask etch rate, and surface roughness in an inductively coupled plasma ICP as a function of vario...

Inductively coupled plasma mass spectrometry.

Review

Effect of Inductively Coupled Plasma Etching in p-Type GaN Schottky Contacts

Photoresist etching in an inductively coupled, traveling wave driven, large area plasma source

We report on experimental and modeling results for photoresist etching with oxygen gas in an inductively coupled large area plasma source ~LAPS!. The source is driven by a 13.56 MHz traveling wave launched along a serpentine antenna embedded in the plasma and has a processing area as large as 40 cm350 cm. We describe a new series-parallel antenna coil configuration, and we present experimental ...

Laser Ablation Inductively Coupled Plasma

Laser ablation inductively coupled plasma mass spectrometry (LA-ICP-MS) is one of the most successful direct solid sampling techniques for major, minor and trace element analysis. However, this technique still suffers from matrix dependent ablation characteristics, which makes quantification very difficult. Furthermore, the laser sampled material alters its composition from the sample to the de...